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Characterization and antimicrobial properties of fluorine-

The film's deposition rate was found to increase with the decreasing CF4 concentration in the gas mixture. Fourier transform spectroscopy revealed the

of CF3I-CO2 gas mixtures as an alternative to SF6 in MV

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dielectric breakdown properties in 50%SF6-50%CF4mixtures

These breakers utilize a gas mixture of SF6 and CF4 or SF6 and N2 to prevent condensation of the SF6 gas and have been type tested at -50oC to

Nanotubes by CF4 Plasma Treatment for SF6 Decomposition

(SF6) is used as a gas medium in gas-O2, N2, CF4, and Ar, plasma, and so forthgas until 90% of the stable resistance is

Eight Single Gases He, N2, O2, Xe, CO2, CH4, CF4, and SF6

Gases He, N2, O2, Xe, CO2, CH4, CF4, and SF6 at Two Film gas mixture density heat capacity forced convective heat transfer heat transfer

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C2CL2F3CF4CF2CL2C2F6SF6-N2CCL2F2CF3CF2CLC4F8

equilibrium and transport properties of low-density gas mixtures. SF6, Ar–C(CH3)4, Kr–CH4, Kr–CF4, Kr–SF6, Kr–C(CH3)4,

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2002521-A method and apparatus for the separation and recovery of SF.sub.6 from a gas mixture consisting essentially of SF.sub.6, CF.sub.4, and N.su

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Breakdown characteristics of SF6 /CF4 mixtures in 25.8 kV

SF<sub>6</sub> gas has excellent dielectric strength, but it causes global warming about 23900 times more than CO<sub>2</

of 13 non-polar gases (He, Ne, Ar, Kr, Xe, H2~, D2~, N2~,

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The fluorination of the polymer polyethylene terephthalate in plasma created from SF6 or CF4 gas at various pressures was investigated. The surface was

of Gases in Liquids. 21. Solubility of He, Ne, Ar, Kr, N2,

Solubility of Gases in Liquids. 21. Solubility of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6 in 2,2,4-Trimethylpentane at

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of Gases in Liquids 9. Solubility of He, Ne, Ar, Kr, N2,

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Decomposed Das Density of CF3I as a Substitute for SF6 Gas

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Electron swarm coefficients in SF6 and CF4 gas mixtures from Monte Analysis of the insulation characteristics of c-C4F8 and N2 gas

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The design and use of equipment and installations applying SF6 gas or SF6/CF4 gas mixtures have been considered in Sect.  12.2and Part C of this

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of Gases in Liquids. 20. Solubility of He, Ne, Ar, Kr, N2,

The Ostwald coefficients L2,1 of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6 dissolved in several homologous n-alkanes, n-ClH2l+2, 6 ≤ l