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These breakers utilize a gas mixture of SF6 and CF4 or SF6 and N2 to prevent condensation of the SF6 gas and have been type tested at -50oC to

Solubility of Gases in Liquids. 20. Solubility of He, Ne, Ar,

CF4, and SF6 dissolved in several homologous n-alkanes, n-ClH2l+2, and appropriate molecular and/or bulk properties of the gases and n-

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Use of SF6 and CF4 | SpringerLink

The design and use of equipment and installations applying SF6 gas or SF6/CF4 gas mixtures have been considered in Sect.  12.2and Part C of this

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field breakdown characteristics of SF6/CF4 mixtures at

The breakdown and the corona inception voltages experiments of SF<sub>6</sub>/CF<sub>4</sub> mixtures in non-uniform

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CFCN/N

10. A method for purifying a fluorine compound gas by removing a metal CF4, SF6 and BF3, and contains hydrogen fluoride and at least one

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2002521-A method and apparatus for the separation and recovery of SF.sub.6 from a gas mixture consisting essentially of SF.sub.6, CF.sub.4, and N.su

Breakdown characteristics of SF6 /CF4 mixtures in 25.8 kV

SF<sub>6</sub> gas has excellent dielectric strength, but it causes global warming about 23900 times more than CO<sub>2</

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The fluorination of the polymer polyethylene terephthalate in plasma created from SF6 or CF4 gas at various pressures was investigated. The surface was

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Negative ion motion in the mixtures of SF6 with CF4 and CH4-Ar.

This paper deals with the measurement of the mobility of negative ions in the mixtures of SF6 with CF4 and the CH4-Ar (50:50) binary mixture with

Characterization and antimicrobial properties of fluorine-

The film's deposition rate was found to increase with the decreasing CF4 concentration in the gas mixture. Fourier transform spectroscopy revealed the

Chemistry studies of SF6/CF4, SF6/O2 and CF4/O2 gas phase

operational conditions: total gas flow rate, gas pressure, and plasmas generated with SF6 and CF4 mixtures or mixed separately with

Solubility of 13 non-polar gases (He, Ne, Ar, Kr, Xe, H2~, D2

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CHF3()CF4 - - -

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Properties of Binary Gas Mixtures of CH4, CF4, SF6, and C(

equilibrium and transport properties of low-density gas mixtures. SF6, Ar–C(CH3)4, Kr–CH4, Kr–CF4, Kr–SF6, Kr–C(CH3)4,