- Reactive ion etching of SiC in SF6 gas: detection of CF,

Last modification on : Thursday, February 7, 2019 - 4:56:13 PMReactive ion etching of SiC in SF6 gas: detection of CF, CF2 and SiF2

Eight Single Gases He, N2, O2, Xe, CO2, CH4, CF4, and SF6

Gases He, N2, O2, Xe, CO2, CH4, CF4, and SF6 at Two Film gas mixture density heat capacity forced convective heat transfer heat transfer

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【PDF】COLD-WEATHER APPLICATION OF GAS MIXTURE (SF6/N2, SF6/CF4)

These breakers utilize a gas mixture of SF6 and CF4 or SF6 and N2 to prevent condensation of the SF6 gas and have been type tested at -50oC to

Materials | Free Full-Text | Comparison of SF6 and CF4 Plasma

The fluorination of the polymer polyethylene terephthalate in plasma created from SF6 or CF4 gas at various pressures was investigated. The surface was

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A mixture of acetylene (C2H2) and carbon tetrafluoride (CF4) gas was The film with a high concentration of fluorine showed excellent performance

Solubilities of gases in liquids 11. The solubilities of He,

Solubilities of gases in liquids 11. The solubilities of He, Ne, Ar, Kr, O2, N2, CO, CO2, CH4, CF4, and SF6 in n-octane 1-octanol, n-

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On Aug 2, 1993 F. Gibanel (and others) published: Solubility of 13 non-polar gases (He, Ne, Ar, Kr, Xe, H2, D2, N2, CH4, C2H4, C2H6,

- Reactive ion etching of SiC in SF6 gas: detection of CF,

Reactive ion etching of SiC in SF6 gas: detection of CF, CF2 and SiF2 etch products. Applied Physics Letters, American Institute of Physics, 2001,

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Solubility of Gases in Binary Liquid Mixtures: An Experimental and 20. Solubility of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6 in

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Solubility of Gases in Liquids. 21. Solubility of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6 in 2,2,4-Trimethylpentane at

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Solubility of gases in liquids. 21. Solubility of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6in 2,2,4-trimethylpentane atT = 298.15 K on

Xe, H2, D2, N2, O2, CH4, C2H4, C2H6, CF4, SF6 and CO2 in

Solubility measurements of several non-polar gases (He, Ne, Ar, Kr, Xe, H2, D2, N2, O2, CH4, C2H4, C2H6, CF4, SF6 and CO2) in

Gases in Liquids. 19. Solubility of He, Ne, Ar, Kr, Xe, N2

"Solubility of Gases in Liquids. 19. Solubility of He, Ne, Ar, Kr, Xe, N2, O2, CH4, CF4, and SF6 in Normal 1-Alkanols n-ClH2l+lOH (1

of Gases in Liquids 9. Solubility of He, Ne, Ar, Kr, N2,

The Solubility of Gases in Liquids 9. Solubility of He, Ne, Ar, Kr, N2, O2, CO, CO2, CH4, CF4, and SF6 in some Dimethylcyclohexanes at 298

gases in liquids. 19. Solubility of He, Ne, Ar, Kr, Xe, N2

Solubility of Gases in Binary Liquid Mixtures: An Experimental and 20. Solubility of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6 in

Properties of Binary Gas Mixtures of CH4, CF4, SF6, and C(

equilibrium and transport properties of low-density gas mixtures. SF6, Ar–C(CH3)4, Kr–CH4, Kr–CF4, Kr–SF6, Kr–C(CH3)4,

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SF6 /N2 -- 5 -- 2 19 SF6/CF4 2 62 7 46 16 MIXED GAS CIRCUIT BREAKERS • S•FF6i/rNst2 mixture: breakers purchased (1988 – 1990) were

【PDF】COLD-WEATHER APPLICATION OF GAS MIXTURE (SF6/N2, SF6/CF4)

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Nanotubes by CF4 Plasma Treatment for SF6 Decomposition

Sulfur hexafluoride (SF6) is used as a gas medium in gas-insulated O2, N2, CF4, and Ar, plasma, and so forth are used to etch the

gases in liquids. 12 Solubility of He, Ne, Ar, Kr, O2, N2,

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Publication » The solubility of gases in liquids 9. Solubility of He, Ne, Ar, Kr, N2, O2, CO, CO2, CH4, CF4, and SF6 in some dimethyl

"Solubility of Gases in Liquids. 17. The Solubility of He, Ne

Solubility of Gases in Liquids. 17. The Solubility of He, Ne, Ar, Kr, H2, N2, O2, CO, CH4, CF4, and SF6 in Tetrachloromethane at 283-318

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g3 gas with 4% NOVECTM 4710/96% CO2 was SF6 has general features of gas for high Trifluoroiodomethane (CF3I) has been introduced

Use of SF6 and CF4 | SpringerLink

The design and use of equipment and installations applying SF6 gas or SF6/CF4 gas mixtures have been considered in Sect.  12.2and Part C of this