of CF3I-CO2 gas mixtures as an alternative to SF6 in MV

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Decomposed Das Density of CF3I as a Substitute for SF6 Gas

1- Interruption Capability and Decomposed Das Density of CF3I as a Substitute for SF6 Gas.2- Electrical Breakdown of CF3I and CF3I-N2 Gas Mixture

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characteristics of SF6-N2 and SF6-CF4 gas mixtures |

2017101- on the insulation characteristics of SF6-N2 and SF6-CF4 gas mixturesThe underlying high-order scheme is supposed to be unconditionally s

of Gases in Liquids. 21. Solubility of He, Ne, Ar, Kr, N2,

Solubility of Gases in Liquids. 21. Solubility of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6 in 2,2,4-Trimethylpentane at

Electron swarm coefficients in SF6 and CF4 gas mixtures from

Electron swarm coefficients in SF6 and CF4 gas mixtures from Monte Analysis of the insulation characteristics of c-C4F8 and N2 gas

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The design and use of equipment and installations applying SF6 gas or SF6/CF4 gas mixtures have been considered in Sect.  12.2and Part C of this

for separation of SF6 from CF4 /air-containing gas stream

2002521-A method and apparatus for the separation and recovery of SF.sub.6 from a gas mixture consisting essentially of SF.sub.6, CF.sub.4, and N.su

C2CL2F3CF4CF2CL2C2F6SF6-N2CCL2F2CF3CF2CLC4F8

equilibrium and transport properties of low-density gas mixtures. SF6, Ar–C(CH3)4, Kr–CH4, Kr–CF4, Kr–SF6, Kr–C(CH3)4,

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Breakdown characteristics of SF6 /CF4 mixtures in 25.8 kV

SF<sub>6</sub> gas has excellent dielectric strength, but it causes global warming about 23900 times more than CO<sub>2</

of Gases in Liquids 9. Solubility of He, Ne, Ar, Kr, N2,

The Solubility of Gases in Liquids 9. Solubility of He, Ne, Ar, Kr, N2, O2, CO, CO2, CH4, CF4, and SF6 in some Dimethylcyclohexanes at 298

Eight Single Gases He, N2, O2, Xe, CO2, CH4, CF4, and SF6

Gases He, N2, O2, Xe, CO2, CH4, CF4, and SF6 at Two Film gas mixture density heat capacity forced convective heat transfer heat transfer

Nanotubes by CF4 Plasma Treatment for SF6 Decomposition

(SF6) is used as a gas medium in gas-O2, N2, CF4, and Ar, plasma, and so forthgas until 90% of the stable resistance is

dielectric breakdown properties in 50%SF6-50%CF4mixtures

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SF6, CO, CH4, C2H4, C2H6, CF4, CO2, C4F8, O2, Ar, Ne, He, Kr,

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The fluorination of the polymer polyethylene terephthalate in plasma created from SF6 or CF4 gas at various pressures was investigated. The surface was

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c-C4F8CF4SF6SST SST Experimental Analysis

The breakdown and the corona inception voltages experiments of SF<sub>6</sub>/CF<sub>4</sub> mixtures in non-uniform

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Reactive ion etching of SiC in SF6 gas: detection of CF, CF2 and SiF2 etch products. Applied Physics Letters, American Institute of Physics, 2001,

gases in liquids. 12 Solubility of He, Ne, Ar, Kr, O2, N2,

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【PDF】Cold Weather Applications of Gas Mixture (SF6/N2, SF6/CF4)

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Negative ion motion in the mixtures of SF6 with CF4 and CH4-Ar.

This paper deals with the measurement of the mobility of negative ions in the mixtures of SF6 with CF4 and the CH4-Ar (50:50) binary mixture with

gases in liquids. 19. Solubility of He, Ne, Ar, Kr, Xe, N2

Solubility of Gases in Binary Liquid Mixtures: An Experimental and 20. Solubility of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6 in

of 13 non-polar gases (He, Ne, Ar, Kr, Xe, H2~, D2~, N2~,

2015311-Get this from a library! Solubility of 13 non-polar gases (He, Ne, Ar, Kr, Xe, H2~, D2~, N2~, CH4~, C2~H4~, C2~H6~, CF4~ and SF6~

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The film's deposition rate was found to increase with the decreasing CF4 concentration in the gas mixture. Fourier transform spectroscopy revealed the

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