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The fluorination of the polymer polyethylene terephthalate in plasma created from SF6 or CF4 gas at various pressures was investigated. The surface was

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of Si and WSiN Using ECR Plasma of SF6–CF4 Gas Mixture -

The characteristics of Si etching with electron cyclotron resonance (ECR) plasma of SF6–CF4 are studied in order to improve anisotropy in dry etching

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Electron swarm coefficients in SF6 and CF4 gas mixtures from

the electron swarm parameters such as effective ionization coefficient, , drift velocity and diffusion coefficient of SF6 and CF4 gas mixtures

of Electron Swarm Parameters in the SF6/CF4 Gas Mixtures -

We use a binary gas mixture Monte Carlo simulation model to calculate the electron transport parameters in SF6/CF4 mixtures in uniform electric fields

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These breakers utilize a gas mixture of SF6 and CF4 or SF6 and N2 to prevent condensation of the SF6 gas and have been type tested at -50oC to