"Solubility of Gases in Liquids. 17. The Solubility of He, Ne

Solubility of Gases in Liquids. 17. The Solubility of He, Ne, Ar, Kr, H2, N2, O2, CO, CH4, CF4, and SF6 in Tetrachloromethane at 283-318

Materials | Free Full-Text | Comparison of SF6 and CF4 Plasma

The fluorination of the polymer polyethylene terephthalate in plasma created from SF6 or CF4 gas at various pressures was investigated. The surface was

SF_6+CF_4-201628-

The characteristics of Si etching with electron cyclotron resonance (ECR) plasma of SF6–CF4 are studied in order to improve anisotropy in dry etching

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Home Search Collections Journals About Contact us My IOPscience Thermophysical properties of CF4/O2 and SF6/O2 gas mixtures This content has been downloaded

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Publication » The solubility of gases in liquids 9. Solubility of He, Ne, Ar, Kr, N2, O2, CO, CO2, CH4, CF4, and SF6 in some dimethyl

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"Solubility of Gases in Liquids. 20. Solubility of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6 in n-Alkanes n-ClH2l+2 (6 ≤ l ≤ 16)

Grid as An Eco-Friendly Alternative Insulation Gas to SF6:

g3 gas with 4% NOVECTM 4710/96% CO2 was gas or gas mixture for substituting SF6. Trifluoroiodomethane (CF3I) has been introduced

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Gases in Liquids 10. The Solubility of He, Ne, Ar, Kr, N2,

The Solubility of Gases in Liquids 10. The Solubility of He, Ne, Ar, Kr, N2, O2, CO, CO2, CH4, CF4, and SF6 in Cyclooctane at 289 to 313

gases in liquids. 19. Solubility of He, Ne, Ar, Kr, Xe, N2

Solubility of Gases in Binary Liquid Mixtures: An Experimental and 20. Solubility of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6 in

Electron swarm coefficients in SF6 and CF4 gas mixtures from

Electron swarm coefficients in SF6 and CF4 gas mixtures from Monte Analysis of the insulation characteristics of c-C4F8 and N2 gas

Properties of Binary Gas Mixtures of CH4, CF4, SF6, and C(

equilibrium and transport properties of low-density gas mixtures. SF6, Ar–C(CH3)4, Kr–CH4, Kr–CF4, Kr–SF6, Kr–C(CH3)4,

characteristics of SF6-N2 and SF6-CF4 gas mixtures |

2017101- on the insulation characteristics of SF6-N2 and SF6-CF4 gas mixturesvalues in tendency changing with pressure, but small errors are also

SF_6/N_2SF_6/CF_4-

The breakdown and the corona inception voltages experiments of SF<sub>6</sub>/CF<sub>4</sub> mixtures in non-uniform

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Anisotropic etching of Si and WSiN using ECR plasma of SF6-CF4 gas mixture on ResearchGate, the professional network for scientists. Anisotropic etchin

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【PDF】Cold Weather Applications of Gas Mixture (SF6/N2, SF6/CF4)

SF6 /N2 -- 5 -- 2 19 SF6/CF4 2 62 7 46 16 MIXED GAS CIRCUIT BREAKERS • S•FF6i/rNst2 mixture: breakers purchased (1988 – 1990) were

Chemistry studies of SF6/CF4, SF6/O2 and CF4/O2 gas phase

operational conditions: total gas flow rate, gas pressure, and plasmas generated with SF6 and CF4 mixtures or mixed separately with

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We use a binary gas mixture Monte Carlo simulation model to calculate the electron transport parameters in SF6/CF4 mixtures in uniform electric fields

of 13 non-polar gases (He, Ne, Ar, Kr, Xe, H2~, D2~, N2~,

2015311-Get this from a library! Solubility of 13 non-polar gases (He, Ne, Ar, Kr, Xe, H2~, D2~, N2~, CH4~, C2~H4~, C2~H6~, CF4~ and SF6~

of gases in liquids. 21. Solubility of He, Ne, Ar, Kr, N2,

Solubility of gases in liquids. 21. Solubility of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6in 2,2,4-trimethylpentane atT = 298.15 K on

Nanotubes by CF4 Plasma Treatment for SF6 Decomposition

Sulfur hexafluoride (SF6) is used as a gas medium in gas-insulated O2, N2, CF4, and Ar, plasma, and so forth are used to etch the

SF6 gas,CF4 gas,liquid ammonia,methane,standard gas mixture-

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Solubilities of gases in liquids 11. The solubilities of He, Ne, Ar, Kr, O2, N2, CO, CO2, CH4, CF4, and SF6 in n-octane 1-octanol, n-

in 50%SF6-50%CF4mixtures at 1 atm -

The design and use of equipment and installations applying SF6 gas or SF6/CF4 gas mixtures have been considered in Sect.  12.2and Part C of this

【PDF】COLD-WEATHER APPLICATION OF GAS MIXTURE (SF6/N2, SF6/CF4)

These breakers utilize a gas mixture of SF6 and CF4 or SF6 and N2 to prevent condensation of the SF6 gas and have been type tested at -50oC to

- Reactive ion etching of SiC in SF6 gas: detection of CF,

Last modification on : Thursday, February 7, 2019 - 4:56:13 PMReactive ion etching of SiC in SF6 gas: detection of CF, CF2 and SiF2

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"Solubilities of Gases in Liquids II. The Solubilities of He,

"Solubilities of Gases in Liquids II. The Solubilities of He, Ne, Ar, Kr, O2, N2, CO, CO2, CH4, CF4, and SF6 in n-Octane 1-Octanol, n-

gas,CF4 gas,liquid ammonia,methane,standard gas mixture-

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